常溫下是一種無色、無臭、性質穩定的氣體，為一種強氧化劑。在微電子工業中

常溫下是一種無色、無臭、性質穩定的氣體，為一種強氧化劑。在微電子工業中是一種優良的等離子蝕刻氣體，在離子蝕刻時裂解為活性氟離子，具有優異的蝕刻速率和選擇性，也可應用於半導體/LCD。

結果 (英文) 1:

At room temperature is a colorless, odorless, stable gas is a strong oxidant. In the microelectronics industry is an excellent plasma etching gas, an active fluoride ion cleavage during plasma etching, etch rate with excellent selectivity and can also be applied to a semiconductor / LCD.

結果 (英文) 2:

At room temperature, it is a colorless, odorless, stable gas, a strong oxidant. In the microelectronics industry is an excellent plasma etching gas, cracking into active fluorine ions when ion slinging, with excellent etching rate and selectivity, can also be applied to semiconductors/LCD.

結果 (英文) 3:

At room temperature, it is a colorless, odorless and stable gas, which is a strong oxidant. It is a kind of excellent plasma etching gas in microelectronics industry. It can be split into active fluorine ions during ion etching. It has excellent etching rate and selectivity, and can also be used in semiconductor / LCD.