本計畫所提出的橫向剪切干涉光路檢測系統可克服傳統Shack-Hartm

本計畫所提出的橫向剪切干涉光路檢測系統可克服傳統Shack-Hartmann檢測系統存在穩定度、靈敏度與解析度不足且無法量測高數值孔徑透鏡及非球面透鏡之缺點。此套透鏡檢測系統經過自行撰寫的模擬程式進行測試，將輸入模擬波前與所計算出的之波前進行比對，其最大相位誤差量約為0.3%。我們預計此系統日後可廣泛應用於光電產業、半導體製程系統、自動化光學檢測、光學元件設計與透鏡檢測等相關領域中。

結果 (英文) 1:

This project proposed lateral shearing interferometer light path detection system may overcome the problems of stability of conventional Shack-Hartmann detector system, and lack of sensitivity and resolution can not be measured and disadvantages of high numerical aperture lens of an aspheric lens. This set of lens detection system has been written self-test simulation program, input analog wavefront and the calculated ratio of the wave front, which is the maximum phase error of approximately 0.3%. We expect that this system can be widely used in future optoelectronics industry, the semiconductor processing system, the related art automated optical detection, detection of the optical element and the lens design and the like.

結果 (英文) 2:

The lateral shear interferometry detection system proposed in this plan can overcome the disadvantages of the traditional Shack-Hartmann detection system, which has insufficient stability, sensitivity and resolution and cannot measure high numerical aperture lenses and aspherical lenses. This lens detection system has been tested by a self-written simulation program, which compares the input simulation wave front with the calculated wave before, with a maximum phase error of about 0.3%. We expect this system to be widely used in the optoelectronics industry, semiconductor process systems, automated optical detection, optical component design and lens detection and other related fields.

結果 (英文) 3:

The proposed system can overcome the shortcomings of the traditional shack Hartmann detection system, such as the lack of stability, sensitivity and resolution, and the inability to measure the height of numerical aperture lens and aspheric lens. The maximum phase error of the system is about 0.3%. We expect that this system can be widely used in the photoelectric industry, semiconductor manufacturing system, automatic optical detection, optical element design and lens detection and other related fields in the future.