The surface of PDMS substrate was m

The surface of PDMS substrate was modified by nitrogen atmospheric plasma treatment, which was tracked by using contact angle analysis as shown in Fig. 1. The untreated surface of PDMS substrate exhibited a water contact angle of 115o. After nitrogen atmospheric plasma treatment, the value of contact angle decreased from 115o to 32o, indicating that the surface of PDMS substrate was modified to create the hydrophilic surface layer. Apart from that, the timeliness of plasma treated PDMS substrate was investigated for the further thermal evaporation treatment. The value of contact angle increased from 32o to 63o with increasing storage time from 1 to 9 min in atmospheric environment. The results indicate that the amount of oxygen functional groups on the plasma treated surface of PDMS substrate decreased with increasing storage time [22]. Therefore, the plasma treated PDMS substrate must be carried out within ten min for the thermal evaporation treatment, which can be avoided the decreasing of oxygen functional groups.

結果 (繁體中文) 2:

PDMS基板表面通過氮氣等離子體處理進行了改性，使用接觸角分析進行跟蹤，如圖1所示。PDMS基板未經處理的表面呈現水接觸角115o。氮氣大氣等離子體處理後，接觸角值從115o降至32o，表明PDMS基板表面被改性，形成親水錶面層。此外，還研究了等離子體處理PDMS基板的及時性，以進一步進行熱蒸發處理。接觸角值從32o增加到63o，大氣環境中的存儲時間從1分鐘增加到9分鐘。結果表明，PDMS基板等離子體處理表面的氧功能組量隨儲存時間的增加而減少[22]。因此，對經過等離子體處理的PDMS基板必須在10分鐘內進行熱蒸發處理，避免氧功能群的減少。

結果 (繁體中文) 3:

採用氮氣常壓电浆處理對PDMS基板表面進行改性，並用接觸角分析法對其進行跟踪，如圖1所示。未經處理的PDMS基底表面的水接觸角為115o，經氮电浆處理後，其接觸角由115o下降到32o，說明PDMS基底表面經過了改性，形成了親水性的表面層。此外，為了進一步的熱蒸發處理，還研究了电浆處理PDMS基板的時效性。在大氣環境中，隨著貯存時間的新增，接觸角從32o新增到63o，從1分鐘新增到9min。結果表明，电浆處理PDMS基底表面的氧官能團數量隨著存放時間的延長而减少[22]。囙此，电浆處理PDMS基板必須在10min內進行熱蒸發處理，才能避免氧官能團的减少。