For further investigation of the as

For further investigation of the as-deposited thin films, composi-
tional characteristics were analyzed by EDS measurement. In Fig. 2 (a)
and (b), the compositional results of as-deposited CZTS thin films
were analyzed. The CZTS thin film deposited by potentiostatic method
shows nearly stoichiometric (Cu:Zn:Sn:S=24.9:16.6:10.6:47.9). In
particular, the zinc (Zn) composition was a little bit highly detected in
the deposition condition. However, the Zn-rich CZTS thin films have
reported high cell performance [21]. On the other hand, the thin film
deposited by pulsed potential electrodeposition method was com-
posed of copper and sulfate elements mainly (Cu:Zn:Sn:
S=59.42:2.59:8.55:29.44). From mentioned above results, it is
indicated that the electrodeposition methods strongly affect the
CZTS thin films characteristics.

結果 (中文) 1:

为进一步调查作为沉积薄膜，组成-EDS 测定，分析了传统特点。在图 2 (a)和 (b) 成分结果作为沉积 CZTS 薄膜的研究进行了分析。CZTS 薄膜恒电位法显示近化学计量 (Cu:Zn:Sn:S = 24.9:16.6:10.6:47.9)。在尤其是锌 (锌) 组成有点高度检测中沉积条件。然而，富含锌的 CZTS 薄膜具有据报道高电池性能 [21]。另一方面，薄膜脉冲电位电沉积法沉积是 com-主要构成的铜和硫酸根元素 (Cu:Zn:Sn:S = 59.42:2.59:8.55:29.44)。从上文所述的结果，它是表明电沉积方法强烈影响CZTS 薄膜特性。

結果 (中文) 3:

对沉积薄膜的进一步调查，组成—通过EDS测量分析性特征。在图2（甲）和（B）组成的结果，制备CZTS薄膜进行了分析。CZTS薄膜采用恒电位法沉积表明近化学计量比（铜：锌锡：S = 24.9:16.6:10.6:47.9）。在特别是，锌（锌）的组合物是一点点的高度检测到沉积条件。然而，锌丰富的CZTS薄膜报告高细胞性能[ 21 ]。另一方面，薄膜脉冲电位沉积法沉积—铜和硫酸盐的构成主要成分（铜：锌：锡：S = 59.42:2.59:8.55:29.44）。从上面的结果，这是表明，电沉积方法强烈影响CZTS薄膜特性。