Figure 3 shows the heating characte

Figure 3 shows the heating characteristics in the ultrahigh-vacuum chamber of the thin film heater with MoSi2 film deposited on the outside of the alumina crucible, taking practical use into consideration. This thin film had high stability, and the heating temperature of this heater reached 1000 °C, with an electric power of approximately 190 W. At a low heating temperature, the pressure increased because of gas generated from the heater and then subsequently decreased with increasing temperature.

結果 (中文) 1:

图3显示了在对氧化铝坩埚外MoSi2薄膜沉积的薄膜加热器的超高真空室的加热特性，以实际使用的考虑。该薄膜具有较高的稳定性，和该加热器加热温度达到1000°C，约190 W的电源在低的加热温度，由于气体从加热和随后降低随着温度的增加，产生的压力增加。

結果 (中文) 2:

图 3 显示加热特征在薄膜加热器超高真空室与 MoSi2 薄膜氧化铝坩埚，同时考虑到实际使用的外面。这种薄膜有高稳定性、 和达到 1000 ° C，与电力的大约 190 W.这加热器的加热温度在较低的加热温度，压力增加气体从加热器生成，然后随后下降随着温度的增加。