1.露光機 UV 燈管點燈時間管制為 1200 小時內 2.底片擦拭

1.露光機 UV 燈管點燈時間管制為 1200 小時內

2.底片擦拭需以無塵布與底片清潔劑及酒精擦拭底片

3.底片擦拭為生產 100 枚基板時需停機擦拭底片

4.機器運轉時可打開機台之外蓋觀看基板曝光情況。

5.露光 PITCH 值無需設定皆可生產
6.曝光能量無限制皆可生產無需確認
7.當第一次生產基板時須先設定基板孔位後再設定底片
8.進出無塵室不須經AIR SHOWER即可進出無塵室
9.露光平均照度為 85 % 以下
10.進入無塵室可以穿工作鞋，不用換無塵鞋。

結果 (英文) 1:

1. exposure within the 1200 hour UV lamp lighting time control 2. negative film cleaner and wipe to clean cloth and alcohol film 3. wipe film for the production of 100 base plate need to shut down to clean films 4. the outside of the machine to open the machine covering the base exposure. 5. exposure PITCH value no set can be produced 6. unlimited exposure energy can be produced without confirmation 7. when producing substrates for the first time shall be set after setting the base plate holes film 8. access to clean room not subject to AIR SHOWER in order to access clean room 9. exposure illumination is 85% below average 10. Enter the clean room to wear work shoes, don't replace dust-free shoes.

結果 (英文) 2:

1. machine UV light exposure lamp lighting time control within 1200 hours

2. backsheet need to wipe clean cloth with detergent and alcohol wipes film backsheet

3. The backsheet wipe substrate for the production 100 need to wipe down the backsheet

4. The operation of the machine when the machine lid can be opened outside the viewing substrate exposure situation.

5. The light exposure PITCH value without setting Jieke production
6. Jieke unlimited exposure energy production without confirmation
7. When the first production of the substrate must first set and then set the film substrate holes
8. AIR shall not be taken out of the clean room SHOWER access to clean room
9. the average intensity of light exposure is 85% or less
10. enter the clean room can be worn work shoes, clean shoes do not change.

結果 (英文) 3:

1 exposure machine UV lamp lighting time control for 1200 hours2 negative cleaning with clean cloth and negative cleaning agent and alcohol wipe film3 negative wipe for the production of 100 substrates need to stop to wipe the film4 when the machine is running, the machine can be opened to see the exposure of the substrate.The 5 meter PITCH value without setting can be produced6 exposure energy without limitation can be produced without confirmation7 when the first substrate is first produced, the substrate hole position is set, and then the film is set.8 in and out of the clean room without the SHOWER AIR can be in and out of clean room9 meter average illuminance is below 85%10 enter the clean room to be able to wear working shoes, do not change clean shoes.